This new generation of MIRA field emission scanning electron microscopes provides users with the advantages of the latest technology, such as new improved high-performance electronics for faster image acquisition, an ultra-fast scanning system with compensation for static and dynamic image aberrations or built-in scripting for user-defined applications, all the while maintaining the best price to performance ratio. The MIRA series was designed with respect to a wide range of SEM applications and needs in today’s research and industry. Its excellent resolution at high beam currents has proved to be advantageous for analytical applications such as EBSD,WDX, etc. MIRA3 field emission scanning electron microscopes are manufactured in configurations with LM, XM and GM chambers.
All MIRA chambers (LM, XM and GM) provide superior specimen handling using a full 5-axis motorized compucentric stage and ideal geometry for EDX and EBSD. Option of extra-large chambers (XM, GM) with robust stage able to accommodate large samples
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