The world’s first fully integrated Xe plasma source FIB with SEM enables extremely high ion currents up to 2 μA thus increasing sputtering rate more than 50 times compared to conventional Ga source. This predetermines FERA3 for milling big volumes of materials that were time consuming or impossible so far.
This new generation of scanning electron microscopes equipped with focused ion beam column provides users with the advantages of the latest technology, such as new improved high-performance electronics for faster image acquisition, ultra-fast scanning system with compensation of static and dynamic image aberrations or built-in scripting for user-defined applications.
They were designed with respect to a wide range of FIB-SEM applications and needs in today’s research and industry. The excellent resolution at high beam current values as well as the powerful software turns the TESCAN FIB-SEMs to excellent tools not only for the analytical but also for many other applications in different field of research and industry.
High Performance Ion Optics
User-Friendly Software and Software Tools